Structural, spectroscopic and electrical properties of dc magnetron sputtered NiO thin films and an insight into different defect states

Abstract In this article, we report a detailed study on the influence of sputter power physical properties NiO films grown by DC magnetron sputtering. Structural studies carried out Grazing Incidence X-ray diffraction (XRD) reveals polycrystalline nature with FCC phase. The crystallographic orientation (111) plane followed (200), (220), and (311) were evident from XRD spectra. average crystallites sizes estimated spectra, values compared using three different plots such as Scherrer, Williamson–Hall size–strain plot. surface morphology was atomic force microscopy. deposited samples show semitransparent behavior in visible region band gap increased 2.70 to 3.34 eV an increase power. Furthermore, photoelectron spectroscopy (XPS) core-level Ni2p spectra deconvoluted observed $${\text{Ni}}2{\text{p}}_{{{\text{3/2}}}}$$ Ni 2 p 3/2 , $${\text{Ni}}2{\text{p}}_{{1/2}}$$ 1 / domain along their satellite’s peaks analyzed. Most importantly, XPS quantification data Raman confirm presence both $${\rm{Ni}}^{2+}$$ Ni + $${\rm{Ni}}^{3+}$$ 3 states films. electrical at room temperature revealed that resistivity film significantly mobility ~ 84 $${\rm{cm}}^{2}{\rm{V}}^{-1}{s}^{-1}$$ cm V - s obtained.